低压化学气相淀积低应力氮化硅工艺研究

导航

王敬轩;商庆杰;杨志

Research on LowStress Silicon Nitride by Using Low Pressure Chemical-Vapor Deposition Process

WANG Jingxuan, SHANG Qingjie, YANG Zhi

电子与封装 . 2021, (8): 80405 . DOI: 10.16257/j.cnki.1681-1070.2021.0815