中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2018, Vol. 18 ›› Issue (10): 1 -3. doi: 10.16257/j.cnki.1681-1070.2018.0105

• 封装、组装与测试 •    下一篇

高温共烧陶瓷金属化膜厚影响因素分析

唐利锋,程 凯,庞学满,张鹏飞   

  1. 南京电子器件研究所,南京 210016
  • 收稿日期:2018-06-02 出版日期:2018-10-20 发布日期:2018-10-20
  • 作者简介:唐利锋(1982—),湖南永州人,2008年毕业于天津大学,硕士学历,现在南京电子器件研究所从事微电子封装技术研究。

Investigation of Metallization Film on High Temperature Co-fired Ceramics

TANG Lifeng, ChENG Kai, PANG Xueman, ZHANG Pengfei   

  1. Nanjing Electronic Devices Institute, Nanjing 210016, China
  • Received:2018-06-02 Online:2018-10-20 Published:2018-10-20

摘要: 金属化膜厚是影响高温共烧陶瓷电性能的重要因素之一。研究了高温共烧陶瓷钨金属化浆料粒度、丝网规格、印刷工艺参数和烧结温度对膜厚的影响。结果表明通过控制浆料中的金属颗粒粒径,提高印刷丝网丝径和涂布的感光膜层厚度,优化印刷刮刀移动速度和烧结温度可获得设计需要的金属化厚膜层。

关键词: 金属化膜厚, 高温共烧陶瓷, 丝网印刷, 烧结温度

Abstract: Metallization film was an important factor of electricity capability on micro-electric ceramic packages. Effects of metallization paste, wire diameter, photo-sensitive film, screen printing speed and sintering temperature on metallization film were researched in this paper. We developed the metallization using controlled diameter of metallization paste’s powder, increased wire diameter of silk screen, thickness of photosensitive emulsion, optimized screen printing speed and sintering temperature.

Key words: thickness of metallization film, high temperature co-fired ceramics, screen printing, sintering temperature

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