用248 nm光刻机制作150 nm GaAs PHEMT器件性能及可靠性评估

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郭　啸，章军云，林　罡

The Performance Test and Reliability Evaluation of 150 nm GaAs PHEMT Based on the 248 nm Stepper

GUO Xiao，ZHANG Junyun，LIN Gang

电子与封装 . 2016, (8): 44 -48 . DOI: 10.16257/j.cnki.1681-1070.2016.0098