中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2023, Vol. 23 ›› Issue (1): 010107 . doi: 10.16257/j.cnki.1681-1070.2023.0036

所属专题: 宽禁带功率半导体器件

• “宽禁带功率半导体器件”专题 • 上一篇    下一篇

氧化镓材料与功率器件的研究进展

何云龙;洪悦华;王羲琛;章舟宁;张方;李园;陆小力;郑雪峰;马晓华   

  1. 西安电子科技大学微电子学院,西安 710071
  • 收稿日期:2022-10-10 出版日期:2023-01-18 发布日期:2023-01-04
  • 作者简介:何云龙(1988—),男,山东济宁人,博士,副教授,现从事宽禁带半导体功率器件研究。

Progress of Gallium Oxide Materials and Power Devices

HE Yunlong, HONG Yuehua, WANG Xichen, ZHANG Zhouning, ZHANG Fang, LI Yuan, LU Xiaoli, ZHENG Xuefeng, MA Xiaohua   

  1. School of Microelectronics, XidianUniversity, Xi’an 710071, China
  • Received:2022-10-10 Online:2023-01-18 Published:2023-01-04

摘要: 氧化镓(Ga2O3)以其禁带宽度大、击穿场强高、抗辐射能力强等优势,有望成为未来半导体电力电子领域的主力军。相比于目前常见的宽禁带半导体SiC和GaN,Ga2O3的Baliga品质因数更大、预期生长成本更低,在高压、大功率、高效率、小体积电子器件方面更具潜力。对Ga2O3外延材料、功率二极管和功率晶体管的国内外最新研究进行了概括总结,展望了Ga2O3在未来的应用与发展前景。

关键词: Ga2O3, 外延材料, 功率二极管, 功率晶体管

Abstract: Gallium oxide (Ga2O3) is expected to become the main force in the future semiconductor power electronics field with its advantages of large forbidden band width, high breakdown field strength and strong radiation resistance. Compared with the common wide band gap semiconductor SiC and GaN, Ga2O3 has advantages of superior Baliga’s figure of merit and lower cost in growth, and more potential for high voltage, high power, high efficiency, and small volume electronic devices. The latest domestic and international research on Ga2O3 epitaxial materials, power diodes and power transistors is summarized, and the future applications and development prospects of Ga2O3 are looked forward to.

Key words: Ga2O3, epitaxial material, powerdiode, power transistor

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