中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

导航

电子与封装 ›› 2018, Vol. 18 ›› Issue (8): 36 -40. doi: 10.16257/j.cnki.1681-1070.2018.0090

• 微电子制造与可靠性 • 上一篇    下一篇

90nm浮栅型P-FLASH器件总剂量电离辐射效应研究

朱少立,汤偲愉,刘国柱,曹立超,洪根深,吴建伟,郑若成   

  1. 中国电子科技集团公司第五十八研究所,江苏 无锡 214035
  • 出版日期:2018-08-20 发布日期:2018-08-20
  • 作者简介:朱少立(1986—),男,安徽池州人,微电子硕士,工艺集成工程师,现主要从事抗辐射SOI工艺开发及可靠性研究工作。

Total Ionizing Radiation Effects of Floating Gate P-Channel FLASH Cell for 90 nm Technology

ZHU Shaoli, TANG Siyu, LIU Guozhu, CAO Lichao, HONG Genshen, WU Jianwei, ZHENG Ruocheng   

  1. China Electronics Technology Group Corporation No.58 Research Institute, Wuxi 214035, China
  • Online:2018-08-20 Published:2018-08-20

摘要: 研究了基于90 nm e FLASH工艺制备的浮栅型P-Channel FLASH单元的总剂量电离辐射效应,主要研究了FLASH单元随总剂量增加的变化规律及编程/擦除时间对FLASH单元抗总剂量能力的影响。研究表明:随着总剂量的增加,浮栅型P-FLASH器件"开"态驱动能力(Idsat)、"关"态漏电(Ioff)及跨导(gm)未发生明显退化,但"擦除/编程"态的阈值窗口明显减小,且呈现"编程"态阈值电压(VTP)下降幅度较"擦除"态(VTE)快的特征|编程/擦除时间的增加会导致FLASH单元阈值电压漂移量,对编程态FLASH单元,编程时间的增大导致阈值电压漂移量增大,而对于擦除态器件FLASH单元,擦除时间的增加导致阈值电压漂移量减小。综上所述,总剂量的增加仅引起浮栅型P-FLASH单元阈值电压的漂移,即浮栅内电荷的转移|编程/擦除时间的增加导致FLASH单元阈值电压漂移量的差异,主要是由于编程/擦除应力时间的增加导致隧道氧化层及界面处陷阱电荷的引入所引起的。

关键词: 浮栅型P-FLASH, 总剂量电离效应, 编程/擦除时间, 阈值电压漂移

Abstract: In this paper, we have studied the total ionizing dose (TID) radiation response up to 150 krad(Si) of floating gate P-channel flash memory cells, fabricated in a 90 nm eFLASH technology. We explored the threshold voltage (VT) degradation mechanism and found that the VTP/VTE of P-channel flash cells shift towards to the fresh State. The off-state current (Ioff) 、saturated current (Idsat) and trans-conductance(gm) were stable under irradiation. By the way, we have also studied the TID radiation response which the pulse of the program/eras period were increased. It can be seen that the number of the pulse of program/eras period could change the VTP/VTE shifts. The change of VTP/VTE shifts were due to the increase of the traps in center and interface of the tunneling oxide.

Key words: floating gate FLASH, total ionizing radiation(TID), erase/program period, threshold voltage shift

中图分类号: