中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2019, Vol. 19 ›› Issue (8): 036 -38. doi: 10.16257/j.cnki.1681-1070.2019.0810

• 微电子制造与可靠性 • 上一篇    下一篇

0.13 μm全耗尽绝缘体上硅晶体管单粒子效应仿真研究

花正勇,马艺珂,殷亚楠,周昕杰,陈 瑶,姚 进,周晓彬   

  1. 中国电子科技集团公司第五十八研究所,江苏 无锡 214035
  • 收稿日期:2019-04-19 出版日期:2019-08-20 发布日期:2020-01-09
  • 作者简介:花正勇(1994—),男,江苏泗阳人,硕士研究生学历,主要研究方向为抗辐射集成电路设计。

Simulation Study on SEE of 0.13 μm FD-SOI Transistors

HUA Zhengyong,MA Yike ,YIN Yanan,ZHOU Xinjie,CHEN Yao,YAO Jin,ZHOU Xiaobin   

  1. China Electronics Technology Group Corporation No.58 Research Institute, Wuxi 214072, China
  • Received:2019-04-19 Online:2019-08-20 Published:2020-01-09

摘要: 文章利用计算机辅助设计Silvaco TCAD仿真工具,研究了0.13 μm全耗尽绝缘体上硅(FD-SOI)晶体管单粒子瞬态效应,分析了不同线性能量转移 (LET)、单粒子入射位置和工作偏置状态对单粒子瞬态的影响。结果表明,LET值的增加会影响沟道电流宽度,加大单粒子瞬态峰值及脉冲宽度。受入射位置的影响,由于栅极中央收集的电荷最多,FD-SOI器件的栅极中央附近区域单粒子瞬态效应最敏感。单粒子瞬态与器件工作偏置状态有很强的相关性,器件处于不同工作偏置状态下,关态偏置受单粒子效应影响最大,开态偏置具有最小的瞬态电流峰值和脉宽。

关键词: FD-SOI, 仿真, 辐射, 单粒子, LET, 偏置

Abstract: Single event effect of 0.13 μm fully depleted silicon-on-insulator (FD-SOI) is investigated using Silvaco TCAD simulation tool. The effects of different linear energy transfer (LET), incident position and bias states on single event effect are analyzed. The simulation results show that the increase of LET value affects the channel width and increase transient pulse peak value and pulse width. The single-event transient effect is affected by the incident position. The most sensitive region of the FD-SOI device is near the center of the gate, and the charges are collected at the center of the gate. The device is in different operating bias states, where the off-state bias condition is most affected by the single event effect. The on-state has the smallest transient pulse peak value and pulse width, and the device operating bias state has a strong correlation with the single event effect.

Key words: FD-SOI, simulation, radiation, single event, LET, bias

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