关键词: 集成电路, 关键尺寸, 方差分析, 回归分析, 均值检验, 匹配

Abstract: In integrated circuit manufacturing enterprises，critical dimension measurement and statistical process control are significant for quality control and process reliability.The paper at first overviews the working principle and issues of scanning electron microscope and highlights the charging effect reduction by adding dummy site and selecting the measurement locations.Then the paper optimizes measurement equipment parameters and matches different measurement machines，thereby enhancing the CPK.The matching optimization method combining the engineering and statistics can be further extended to data matching of various measurement machines.

Key words: IC, critical dimension, variance analysis, regression analysis, mean value test, matching