关键词: 化学染色, 常规染色法, 剖面染色法, 超结染色液, PN结缺陷定位

Abstract: Chemical staining is a common PN junction method. At present, conventional chemical staining techniques include grinding angle method, rolling tank method, electrolytic water oxidation method and cross-section staining method. In this paper, a new cross-section chemical staining technology is proposed, which adds the steps of surface stripping, staining and observation to the traditional cross-section staining method. It can break through the limitations of conventional chemical staining technologies. It can also realize the observation of PN junction distribution and the defect location analysis of PN junction. Furthermore, it is found that the use of super junction staining solution in the new chemical staining step can significantly improve the effect and success rate of chemical staining.The time and cost for reverse engineering and failure analysis of semiconductor products are greatly reduced. And it provides a direction for PN junction analysis.

Key words: chemical staining, conventional staining methods, new staining methods, super junction staining solution, PN junction defect location