[1] YANG D Y, KIM B, EOM T H, et al. Epitaxial growth of alpha gallium oxide thin films on sapphire substrates for electronic and optoelectronic devices: Progress and perspective[J]. Electronic Materials Letters, 2022, 18(2): 113-28. [2] OSHIMA T, NAKAZONO T, MUKAI A, et al. Epitaxial growth of γ-Ga2O3 films by mist chemical vapor deposition[J]. Journal of Crystal Growth, 2012, 359: 60-63. [3] GOTTSCHALCH V, MERKER S, BLAUROCK S, et al. Heteroepitaxial growth of α-, β-, γ- and κ-Ga2O3 phases by metalorganic vapor phase epitaxy[J]. Journal of Crystal Growth, 2019, 510: 76-84. [4] HE H Y, ORLANDO R, BLANCO M A, et al. First-principles study of the structural, electronic, and optical properties of Ga2O3 in its monoclinic and hexagonal phases[J]. Physical Review B, 2006, 74(19): 195123. [5] GAKE T, KUMAGAI Y, OBA F. First-principles study of self-trapped holes and acceptor impurities in Ga2O3 polymorphs[J]. Physical Review Materials, 2019, 3(4): 044603 [6] YOSHIOKA S, HAYASHI H, KUWABARA A, et al. Structures and energetics of Ga2O3 polymorphs[J]. Journal of Physics: Condensed Matter, 2007, 19(34): 346211. [7] CORA I, MEZZADRI F, BOSCHI F, et al. The real structure of ε-Ga2O3 and its relation to κ-phase[J]. CrystEngComm, 2017, 19(11): 1509-1516. [8] OSHIMA Y, YAGYU S, SHINOHE T. Epitaxial lateral overgrowth of r-plane α-Ga2O3 with stripe masks along ?-12-10?[J]. Journal of Applied Physics, 2021, 130(17): 1-6. [9] ZHANG Y J, WANG Z P, KUANG Y, et al. Dislocation dynamics in α-Ga2O3 micropillars from selective-area epitaxy to epitaxial lateral overgrowth[J]. Applied Physics Letters, 2022, 120(12): 121601. [10] JINNO R, UCHIDA T, KANEKO K, et al. Reduction in edge dislocation density in corundum-structured α-Ga2O3 layers on sapphire substrates with quasi-graded α-(Al,Ga)2O3 buffer layers[J]. Applied Physics Express, 2016, 9(7): 071101. [11] KAN S I, TAKEMOTO S, KANEKO K, et al. Electrical properties of alpha-Ir2O3/alpha-Ga2O3 pn heterojunction diode and band alignment of the heterostructure[J]. Applied Physics Letters, 2018, 113(21): 212104. [12] HAO J G, GONG H H, CHEN X H, et al. In situ heteroepitaxial construction and transport properties of lattice-matched α-Ir2O3/α-Ga2O3 p-n heterojunction[J]. Applied Physics Letters, 2021, 118(26): 1-7. [13] OSHIMA Y, KAWARA K, OSHIMA T, et al. In-plane orientation control of (001) κ-Ga2O3 by epitaxial lateral overgrowth through a geometrical natural selection mechanism[J]. Japanese Journal of Applied Physics, 2020, 59(11): 115501. [14] POLYAKOV A Y, NIKOLAEV V I, PECHNIKOV A I, et al. Structural and electrical properties of thick κ-Ga2O3 grown on GaN/sapphire templates[J]. APL Materials, 2022, 10(6): 061102. [15] CHEN Y T, NING H K, KUANG Y, et al. Band alignment and polarization engineering in κ-Ga2O3/GaN ferroelectric heterojunction[J]. Science China: Physics, Mechanics & Astronomy, 2022, 65(7): 151-156. [16] FUJITA S, KANEKO K. Epitaxial growth of corundum-structured wide band gap III-oxide semiconductor thin films[J]. Journal of Crystal Growth, 2014, 401: 588-92. [17] NISHINAKA H, TAHARA D, YOSHIMOTO M. Heteroepitaxial growth of ε-Ga2O3 thin films on cubic (111) MgO and (111) yttria-stablized zirconia substrates by mist chemical vapor deposition[J]. Japanese Journal of Applied Physics, 2016, 55(12): 1202bc. [18] TAHARA D, NISHINAKA H, MORIMOTO S, et al. Stoichiometric control for heteroepitaxial growth of smooth ε-Ga2O3 thin films onc-plane AlN templates by mist chemical vapor deposition[J]. Japanese Journal of Applied Physics, 2017, 56(7): 078004. [19] ARATA Y, NISHINAKA H, TAHARA D, et al. Heteroepitaxial growth of single-phase epsilon-Ga2O3 thin films on c-plane sapphire by mist chemical vapor deposition using a NiO buffer layer[J]. Crystengcomm, 2018, 20(40): 6236-6242. [20] NISHINAKA H, MIYAUCHI N, TAHARA D, et al. Incorporation of indium into epsilon-gallium oxide epitaxial thin films grown via mist chemical vapour deposition for bandgap engineering[J]. Crystengcomm, 2018, 20(13): 1882-1888. [21] TAHARA D, NISHINAKA H, MORIMOTO S, et al. Heteroepitaxial growth of epsilon-(AlxGa1?x)2O3 alloy films on c-plane AlN templates by mist chemical vapor deposition[J]. Applied Physics Letters, 2018, 112(15): 152102. [22] HAO J G, MA T C, CHEN X H, et al. Phase tailoring and wafer-scale uniform hetero-epitaxy of metastable-phased corundum alpha-Ga2O3 on sapphire[J]. Applied Surface Science, 2020, 513: 145871. [23] OSHIMA Y, VILLORA E G, MATSUSHITA Y, et al. Epitaxial growth of phase-pure epsilon-Ga2O3 by halide vapor phase epitaxy[J]. Journal of Applied Physics, 2015, 118(8): 085301. [24] NIKOLAEV V I, PECHNIKOV A I, NIKOLAEV V V, et al. HVPE growth of α- and ε-Ga2O3 on patterned sapphire substrates[J]. Journal of Physics: Conference Series, 2019, 1400(5): 055049. [25] SEACAT S, LYONS J L, PEELAERS H. Properties of orthorhombic Ga2O3 alloyed with In2O3 and Al2O3[J]. Applied Physics Letters, 2021, 119(4): 042104. [26] BOSCHI F, BOSI M, BERZINA T, et al. Hetero-epitaxy of epsilon-Ga2O3 layers by MOCVD and ALD[J]. Journal of Crystal Growth, 2016, 443: 25-30. [27] XIA X C, CHEN Y P, FENG Q J, et al. Hexagonal phase-pure wide band gap ε-Ga2O3 films grown on 6H-SiC substrates by metal organic chemical vapor deposition[J]. Applied Physics Letters, 2016, 108(20): 202103. [28] SUN H, LI K H, CASTANEDO C G T, et al. HCl flow-induced phase change of α-, β-, and ε-Ga2O3 films grown by MOCVD[J]. Crystal Growth & Design, 2018, 18(4): 2370-2376. [29] EGYENES-PORSOK F, GUCMANN F, HUSEKOVA K, et al. Growth of α- and β-Ga2O3 epitaxial layers on sapphire substrates using liquid-injection MOCVD[J]. Semicond Sci Technol, 2020, 35(11): 115002. [30] KNEISS M, HASSA A, SPLITH D, et al. Tin-assisted heteroepitaxial PLD-growth of κ-Ga2O3 thin films with high crystalline quality[J]. APL Materials, 2019, 7(2): 022516. [31] KRACHT M, KARG A, SCHOERMANN J, et al. Tin-assisted synthesis of ε-Ga2O3 by molecular beam epitaxy[J]. Physical Review Applied, 2017, 8(5): 054002 [32] JINNO R, CHANG C S, ONUMA T, et al. Crystal orientation dictated epitaxy of ultrawide-bandgap 5.4- to 8.6-eV α-(AlGa)2O3 on m-plane sapphire[J]. Science Advances, 2021, 7(2): eabd5891. [33] YUSA S, OKA D, FUKUMURA T. High-kappa dielectric epsilon-Ga2O3 stabilized in a transparent heteroepitaxial structure grown by mist CVD at atmospheric pressure[J]. Crystengcomm, 2020, 22(2): 381-385. [34] OKA D, YUSA S, KIMURA K, et al. Analyses on atomic arrangement in dielectric ε-Ga2O3 epitaxial thin films[J]. Japanese Journal of Applied Physics, 2020, 59(1): 010601. [35] ZHANG Y, GONG Y, CHEN X, et al. Unlocking the single-domain heteroepitaxy of orthorhombic κ-Ga2O3 via phase engineering[J]. ACS Applied Electronic Materials, 2021, 4(1): 461-468. [36] MCCANDLESS J P, CHANG C S, NOMOTO K, et al. Thermal stability of epitaxial α-Ga2O3 and (Al,Ga)2O3 layers on m-plane sapphire[J]. Applied Physics Letters, 2021, 119(6): 062102.
|