高精度电子束光刻技术在微纳加工中的应用

doi:10.16257/j.cnki.1681-1070.2017.0060

电子与封装 ›› 2017, Vol. 17 ›› Issue (5): 28 -32. doi: 10.16257/j.cnki.1681-1070.2017.0060

高精度电子束光刻技术在微纳加工中的应用

胡超¹，王兴平¹，尤春¹，孙锋²

1.无锡中微掩模电子有限公司，江苏无锡214135；2.中国电子科技集团公司第58研究所，江苏无锡214072

收稿日期:2016-11-28 出版日期:2017-05-19 发布日期:2017-05-19
作者简介:胡超（1990—），男，江苏江阴人，硕士，现在无锡中微掩模电子有限公司从事掩模工艺技术研究。

Application of High Resolution Electron Beam Lithography Technology in Micro-and Nano-fabrication

HU Chao¹,WANG Xingping¹,YOU Chun¹,SUN Feng²

1.Wuxi Zhongwei Mask Electronics Co.,Ltd.,Wuxi 214135,China；2.China Electronics Technology Group Corporation No.58 Research Institute,Wuxi 214072,China

Received:2016-11-28 Online:2017-05-19 Published:2017-05-19

摘要/Abstract

摘要： 对电子束光刻系统的原理以及在微纳加工领域的应用进行了讨论。首先对光刻系统的工作原理进行了阐述。然后讨论了电子束光刻的关键工艺，如光胶的选择、剥离工艺的优化以及邻近效应对图形的影响及修正方法。由于电子束光刻在科研领域展现了巨大的潜力，因此吸引了许多学者的注意。最后，举例介绍了电子束光刻在生物医学和硅光电子上的应用。

关键词: 电子束光刻, 微纳加工, 纳米电子器件

Abstract: In the paper,the principle of Electron Beam Lithography(EBL)and the application in micro-and nano-fabrication are presented.At first,operating principle of EBL system is overviewed.Then a detailed discussion on key process in EBL is made,such as the choice of Resist,optimized lift-off process and modification ofproximity effect.In the finalpart,severalexamples on biologicalmedicine and silicon photonics applications are added.The EBL is now attaching increasingly more attention due to its great potentials in the days to come.

Key words: electron beam lithography, micro-and nano-fabrication, nano-electronic device

中图分类号:

TN305.7

胡超，王兴平，尤春，孙锋. 高精度电子束光刻技术在微纳加工中的应用[J]. 电子与封装, 2017, 17(5): 28 -32.

HU Chao,WANG Xingping,YOU Chun,SUN Feng. Application of High Resolution Electron Beam Lithography Technology in Micro-and Nano-fabrication[J]. Electronics & Packaging, 2017, 17(5): 28 -32.

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中国电子学会电子制造与封装技术分会会刊

高精度电子束光刻技术在微纳加工中的应用

Application of High Resolution Electron Beam Lithography Technology in Micro-and Nano-fabrication

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