关键词: 可控硅, 热电偶, 温度控制, 电压调整, ASME2000外延炉

Abstract: The ASM E2000 epitaxial furnace uses silicon controlled rectifier (SCR) to control the input voltage of the heating lamps, and is heated by using thermocouple (TC) to monitor and feedback the temperature. In the heating system of this model, the calibration accuracy of each voltage determines the temperature accuracy of the system control. The temperature control system under this study can be divided into TC circuit boards and SCR circuit boards. For the voltage calibration of the TC signal processing board, the calibration accuracy should be ± 0.01 V. For the voltage calibration of the SCR control signal, the calibration accuracy should be ± 0.001 V. For the voltage calibration of the SCR output, the incoming voltage should be prioritized to measure, adjustments should be made according to the specific situation of the load and the incoming voltage, and the calibration accuracy should be ± 1 V. This calibration method can effectively and accurately control the growth temperature, minimize the variability between machines, and improve the standardization ability of machines.

Key words: silicon controlled rectifier, thermocouple, temperature control, voltage adjustment, ASM E2000 epitaxial furnace