关键词: Mura, OLED, 掩模版, 显影

Abstract: As a key technical index, Mura defect control determines the display quality and the yield of OLED devices directly. For the Mura defects occurring in the production process of OLED mask, it is found that such defects are related to the adjacent auxiliary graphics of array pixel units through Mura defect analysis, and exhibit uneven array pixel unit critical dimensional (CD) and macro color difference after the developing process. According to the analysis of developing process, a step by step developing scheme is proposed based on the rotary spray developing mode, and experimental tests are conducted to analyze the effects of process parameters such as developer flow rate, chuck rotate speed, pure water flow rate, and pure water/developer overlap time to Mura defects. By optimizing the developing process, the CD range of pixel unit arrays is less than 120 nm and the Mura defect area decreases from more than 3% to invisible. The experimental results show that this method can improve the Mura defect noteworthy.

Key words: Mura, OLED, mask, developing