中国电子学会电子制造与封装技术分会会刊

中国半导体行业协会封测分会会刊

无锡市集成电路学会会刊

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电子与封装

• 封装、组装与测试 •    下一篇

弯液面限域电化学沉积在电子封装领域的应用

卢品静1,2,雷雨3,黄晓龙3,余四文1,程昱川1,任勇2,郭建军1,孙爱华1   

  1. 1. 中国科学院宁波材料技术与工程研究所原子尺度与微纳制造实验室,浙江 宁波  315201;2. 宁波诺丁汉大学理工学院机械、材料与制造工程系,浙江 宁波 315100;3. 甬江实验室激光微纳制造与测量研究组,浙江 宁波 315201
  • 收稿日期:2025-12-07 修回日期:2026-01-12 出版日期:2026-01-26 发布日期:2026-01-26
  • 通讯作者: 孙爱华
  • 基金资助:
    国家自然科学基金(52273241);宁波市自然科学基金(2023J050);宁波市自然科学基金(2024J063;中国博士后科学基金面上项目(2024M763379)

Application of Curved-Surface Localized Electrochemical Deposition in Electronic Packaging

LU Pinjing¹,², LEI Yu³, HUANG Xiaolong³, YU Siwen¹, CHENG Yuchuan¹, REN Yong², GUO Jianjun¹, SUN Aihua¹   

  1. 1. Laboratory of Atomic Scale and Micro/Nano Manufacturing, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China; 2. Department of Mechanical, Materials and Manufacturing Engineering, School of Science and Engineering, University of Nottingham Ningbo China, Ningbo 315100, China; 3. Laser Micro/Nano Manufacturing and Measurement Research Group, Yongjiang Laboratory, Ningbo 315201, China
  • Received:2025-12-07 Revised:2026-01-12 Online:2026-01-26 Published:2026-01-26

摘要: 弯液面限域电化学沉积技术作为一种新兴的增材制造技术,是一种在空气环境下即可实现限定区域内微米甚至纳米尺度金属结构的三维打印方法。其原理是在装有金属盐溶液的针尖与基底接触后建立的微/纳米尺度弯液面内发生氧化还原反应,金属离子在阴极表面被还原为金属单质,同时通过控制针尖与基底的相对运动,可以实现二维或三维金属结构的原位成型。影响弯液面限域电化学沉积的主要因素有针尖尺寸、电流密度、电解液组成、环境温湿度及打印速度等。这项技术已实现铜、镍、钴及半导体硫化物等多种功能材料的沉积,有望在电子封装、柔性电子、光伏能源领域实现小批量应用,成为微结构制造与功能集成相结合的核心技术之一,并为未来先进封装提供有力的技术支撑。

关键词: 弯液面限域电化学沉积, 电化学沉积, 弯液面, 微打印, 电子封装

Abstract: As a novel technology of additive manufacturing, meniscus-confined electrodeposition (MCED) is a kind of three-dimensional printing method that can realize micron or even nanometer-scale metal structures in a confined area under an air environment. The fabrication principle is based on the oxidation-reduction reaction in the micro/nano-scale electrolyte meniscus established between the micropipette tip and the substrate, where the metal ions are reduced into pure metal on the cathode surface. Two-dimensional or three-dimensional complex metal structures can be fabricated in situ by controlling the relative motion between the needle tip and the substrate. The key factors that affect the confined electrochemical deposition in the meniscus are the micropipette tip size, current density, electrolyte composition, microenvironment temperature and humidity, and nozzle moving velocity. This technique has been successfully employed in the fabrication of various functional materials, including copper, nickel, cobalt, and semiconductor sulfides, which hold potential for large-scale applications in areas such as electronic packaging, flexible electronics, and photovoltaic energy. As a core technology integrating microstructure manufacturing with functional integration, it will provide robust technical support for future advanced packaging solutions.

Key words: meniscus-confined electrodeposition, electrochemical deposition, meniscus, micro-additive printing, electronic packaging