中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2024, Vol. 24 ›› Issue (11): 110203 . doi: 10.16257/j.cnki.1681-1070.2024.0158

• 封装、组装与测试 • 上一篇    下一篇

芯片焊盘加固提升Au-Al键合可靠性研究

王亚飞,杨鲁东,吴雷,李宏   

  1. 北京七星华创微电子有限责任公司,北京? 101200
  • 收稿日期:2024-05-27 出版日期:2024-11-25 发布日期:2024-11-25
  • 作者简介:王亚飞(1989—),男,山西晋中人,硕士,主要从事混合集成电路和先进封装领域组装工艺工作。

Improving the Reliability of Au-Al Bonding through Chip Pad Reinforcement

WANG Yafei, YANG Ludong, WU Lei, LI Hong   

  1. Beijing Sevenstar Micro-elec Co., Ltd., Beijing 101200, China
  • Received:2024-05-27 Online:2024-11-25 Published:2024-11-25

摘要: 在芯片铝焊盘的表面制备了Cu/Ni/Au凸块对芯片进行焊盘加固,通过焊盘结构的优化解决常规芯片铝焊盘在金丝键合时存在的工艺窗口小和金铝键合长期可靠性的问题。芯片进行焊盘加固后强度大幅度提升,有效避免了键合时击穿焊盘下介质层导致的短路问题。Ni层的存在有效避免了高温贮存时金属间化合物的生长导致的柯肯达尔空洞问题。通过试验证实了焊盘加固能大幅提高引线键合的工艺窗口,在300 ℃、24 h高温贮存试验中焊盘加固后的界面组织保持高度稳定。

关键词: 引线键合, 金属间化合物, 焊盘加固, 凸块, 可靠性

Abstract: Cu/Ni/Au bump was prepared on the surface of the Al pad of the chip to strengthen the pad, and the optimization of the pad structure solved the problems of narrow process window and long-term reliability of gold-aluminum bonding during gold wire bonding for conventional chip aluminum pads. After the chip was strengthened, the strength was effectively avoiding the short circuit problem caused by breakdown of the dielectric layer under the pad during bonding. The presence of the Ni layer effectively avoided the Kirkendall void problem caused by the growth of intermetallic compounds during high-temperature storage. Experiments confirmed that pad reinforcement can greatly improve the process window of wire bonding, and the interface organization after pad reinforcement remained highly stable in a high-temperature storage test at 300 ℃ and 24 h.

Key words: wire bonding, intermetallic compound, strengthening die pad, bump, reliability

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