掩模涨缩技术在衍射光学元件制作中的应用

doi:10.16257/j.cnki.1681-1070.2020.0807

电子与封装 ›› 2020, Vol. 20 ›› Issue (8): 080405 . doi: 10.16257/j.cnki.1681-1070.2020.0807

• 微电子制造与可靠性 • 上一篇

掩模涨缩技术在衍射光学元件制作中的应用

张鹏，李嘉，丁鼎

无锡中微掩模电子有限公司，江苏无锡　214000

接受日期:2020-06-18 出版日期:2020-08-25 发布日期:2020-08-25
作者简介:张　鹏（1982—），男，山东海阳人，本科，毕业于东南大学计算机系，主要从事掩模数据处理与信息化建设相关工作。

Application of Mask Sizing Issues in the Fabrication of Diffractive Optical Elements

ZHANG Peng, LI Jia, DING Ding

Wuxi Zhongwei Mask Electronics Co., Ltd., Wuxi 214000, China

Accepted:2020-06-18 Online:2020-08-25 Published:2020-08-25

摘要/Abstract

摘要： 衍射光学元件是指功能结构尺寸在微米、纳米量级的光学元器件，如何大规模批量制作光学元件是目前研究的重要问题。首先介绍了半导体器件的制作工艺及其应用在衍射光学元件制作上的可行性，分析了感应耦合等离子体 (ICP) 刻蚀技术用于衍射光学器件制作的反应机理。研究了掩模数据处理中的涨缩技术，将该技术引入衍射光学元件制作中并制作了掩模版。最后，使用经过数据涨缩处理后的掩模版制作微光器件，与未经过数据涨缩处理的掩模版制作的衍射光学元件进行对比。结果表明，使用相同工艺制作，衍射光学元件数据处理过程中引入涨缩技术不仅可以有效提高刻蚀深度的精度，还可以明显降低衍射零级能量。

关键词: 衍射光学元件, 感应耦合等离子体刻蚀技术, 涨缩技术, 零级光能量

Abstract: The functional structural dimensions of diffractive micro-optical elements are in the order of micrometers and nanometers. How to make diffractive micro-optical elements on a large scale is an important issue in current research. First, the manufacturing process of semiconductor devices and the feasibility of their application in the production of micro-optical elements are introduced. The reaction mechanism of Inductive coupled plasma (ICP) etching technology used in the fabrication of diffractive optical elements is analyzed. The sizing issues in mask data processing is studied, and the technology is introduced into the manufacture of diffractive optical elements and a mask is produced. Finally, a mask with data sizing handling was used to make a micro-optical element, compared with the diffractive optical element produced by a mask without sizing handling. The results prove that it can not only effectively improve the accuracy of the etching depth, but also significantly reduce the zero-order energy of diffraction.

Key words: diffractive optical element, inductive coupled plasma etching technology, sizing issues, zero-order light energy

张鹏，李嘉，丁鼎. 掩模涨缩技术在衍射光学元件制作中的应用[J]. 电子与封装, 2020, 20(8): 080405 .

ZHANG Peng, LI Jia, DING Ding. Application of Mask Sizing Issues in the Fabrication of Diffractive Optical Elements[J]. Electronics & Packaging, 2020, 20(8): 080405 .

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掩模涨缩技术在衍射光学元件制作中的应用

Application of Mask Sizing Issues in the Fabrication of Diffractive Optical Elements

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