中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2021, Vol. 21 ›› Issue (3): 030403 . doi: 10.16257/j.cnki.1681-1070.2021.0310

• 微电子制造与可靠性 • 上一篇    下一篇

基于SOI工艺的二极管瞬时剂量率效应数值模拟

冒国均1;边炜钦1;薛海卫1;杨光安2   

  1. 1.中国电子科技集团公司第五十八研究所,江苏 无锡 214035;2. 东南大学,南京 210001
  • 收稿日期:2020-07-30 出版日期:2021-03-23 发布日期:2020-10-19
  • 作者简介:冒国均(1980—),男,本科,江苏南通人,工程师,研究方向为集成电路应用。

Numeric Simulation of Diode Transient Dose Rate Effect Based on SOIProcess

Mao Guojun1, Bian Weiqin1, XUE Haiwei1, Yang Guangan2   

  1. 1. China ElectronicsTechnology Group Corporation No.58Research Institute, Wuxi 214072,China;2. Southeast University, Nanjing 210001, China
  • Received:2020-07-30 Online:2021-03-23 Published:2020-10-19

摘要: 为研究SOI MOS器件中寄生PN二极管在瞬时剂量率辐射下产生的光电流效应,采用TCAD工具,对0.13 μm SOI工艺的PN二极管进行建模,数值模拟了二极管光电流变化与不同瞬态γ剂量率辐照之间的关系。通过模拟PN+型、P+N型两种二极管结构在不同偏置电压、不同剂量率辐射下的抗瞬时剂量率辐射能力,可以得出当瞬时剂量率为1×1014 rad(Si)/s时,二极管在辐照下产生的光电流增量为辐照前的20%左右。该结论为集成电路器件的抗瞬时剂量率设计与仿真提供了数值参考。

关键词: 瞬时剂量率效应, 数值模拟, 二极管, 光电流

Abstract: For researching the photocurrents of parasitic PN diode caused by the transient dose rate effect in SOI MOS devices. PN diode in 0.13 μm SOI process is modeled by using TCAD tools in this paper. The relationship between the optical-currents and theγdose rate is released by numeric simulation. The ability of anti-transient dose rate radiation is evaluated between the two type diodes through different bias voltages and different transient dose rates. When the dose-rate is reaching 1×1014 rad(Si)/s,the optical-current of diode caused by transient dose rate is about 20 % larger than that before the radiation. The conclusion of diode numeric simulation provides the reference for anti-transient dose rate in MOS devices.

Key words: transientdoserateeffect, numericsimulation, diode, optical-current

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