中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2025, Vol. 25 ›› Issue (8): 080106 . doi: 10.16257/j.cnki.1681-1070.2025.0165

• "新型传感器设计及封装技术"专题 • 上一篇    下一篇

MoS2光电探测器的温度依赖性研究

王家驹,王子坚,南海燕   

  1. 江南大学集成电路学院,江苏 无锡  214401
  • 收稿日期:2025-06-04 出版日期:2025-09-02 发布日期:2025-09-02
  • 作者简介:王家驹(2002—),男,江苏扬州人,硕士研究生,主要研究方向为基于低维半导体材料的光电器件。

Temperature Dependence Study of MoS2 Photodetectors

WANG Jiaju, WANG Zijian, NAN Haiyan   

  1. School ofIntegrated Circuits, Jiangnan University, Wuxi 214401, China
  • Received:2025-06-04 Online:2025-09-02 Published:2025-09-02

摘要: MoS2具有许多优异的光电特性,如优异的光吸收能力、较宽的光响应范围、较高的光电转换效率等,被应用于各个领域。研究结果表明,薄层MoS2的高温稳定性存在显著挑战。当温度超过200 ℃时,材料内部会形成大量硫空位,这些缺陷位点容易吸附环境中的氧分子,从而导致非预期掺杂效应并引发电学性能波动。若温度进一步升高至300 ℃以上,材料将发生氧化反应,其本征电学特性与光电响应性能将产生不可逆的剧烈变化。采用具有较低接触电阻的内嵌电极结构,并通过干法转移将MoS2材料转移到内嵌电极上,制备了高质量的MoS2光电探测器。对该器件进行不同温度的退火处理,通过拉曼光谱、荧光光谱对材料的结构变化进行了表征,借助输出特性、转移特性曲线和光电流响应曲线对器件的温度依赖性进行了分析。结果表明,经过300 ℃退火后,器件的上升和衰减时间都显著缩短,上升时间从3.76 s降至48 ms,衰减时间从283.2 s降至23 ms。为进一步探究其中机理,采用六方氮化硼(h-BN)在MoS2顶部封装进行实验求证,发现封装能够有效抑制高温下硫空位的形成以及空气中氧掺杂对器件性能的影响。这为深化理解MoS2的温度依赖性,优化其在光电器件中的高温稳定性提供了理论与实验依据。

关键词: MoS2, 光电探测器, 高温, 六方氮化硼

Abstract: MoS2 possesses numerous excellent optoelectronic properties, such as outstanding light absorption capability, a wide photoresponse range, and high photoelectric conversion efficiency, so it is applied in various fields. The research results indicate that the high-temperature stability of thin-layer MoS2 faces significant challenges. When the temperature exceeds 200 ℃, a large number of sulfur (S) vacancies will form inside the material. These defect sites are prone to adsorb oxygen molecules from the environment, thereby causing unexpected doping effects and leading to fluctuations in electrical properties. If the temperature rises further to above 300 ℃, the material will undergo an oxidation reaction, and its intrinsic electrical characteristics and photoelectric response performance will undergo irreversible drastic changes. High-quality MoS2 photodetectors are fabricated by using an embedded electrode structure with low contact resistance and transferring MoS2 material onto the embedded electrode via dry transfer method. The device is annealed at different temperatures, and the structural changes of the material are characterized by Raman and photoluminescence spectroscopy. The temperature dependence of the device is analyzed by output and transfer characteristic curves as well as photocurrent response curves. The results show that after annealing at 300 ℃, both the rise time and decay time of the device are significantly shortened. The rise time decreases from 3.76 s to 48 ms, and the decay time reduces from 283.2 s to 23 ms. To further investigate the underlying mechanism, the experiment uses hexagonal boron nitride (h-BN) to encapsulate the top of MoS2 for verification. It is found that encapsulation can effectively inhibit the formation of sulfur vacancies at high temperatures and the influence of oxygen doping in the air on the device performance. This provides theoretical and experimental basis for in-depth understanding of the temperature dependence of MoS2 and optimizing its high-temperature stability in optoelectronic devices.

Key words: MoS2, photodetector, high temperature, hexagonal boron nitride

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