中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2020, Vol. 20 ›› Issue (12): 120204 . doi: 10.16257/j.cnki.1681-1070.2020.1212

• 封装、组装与测试 • 上一篇    下一篇

2.5D器件中硅通孔结构设计

赵文中;樊帆;林鹏荣;谢晓辰;杨俊   

  1. 北京微电子技术研究所,北京 100076
  • 收稿日期:2020-06-16 发布日期:2020-08-20
  • 作者简介:赵文中(1992—),男,河南沁阳人,硕士研究生,现从事微电子封装领域研究工作。

The Structure Design ofThrough Silicon Via in 2.5D Devices

ZHAO Wenzhong, FAN Fan, LIN Pengrong, XIE Xiaochen, YANG Jun   

  1. Beijing Microelectronics Technology Institute, Beijing 100076, China
  • Received:2020-06-16 Published:2020-08-20

摘要: 通过ANSYS有限元仿真技术对2.5D器件中的硅通孔结构进行结构设计、仿真分析。通过对比仿真结果,得出更适用于宇航用高低温循环场景下的硅通孔结构。首先通过对比热循环载荷条件下不同2.5D器件中硅通孔结构的热力学性能;其次选取不同的封装材料对硅通孔结构进行建模,研究不同硅通孔模型中的应力集中行为,并对其长期可靠性进行分析;最终得到更适用于宇航环境的2.5D器件的硅通孔结构。

关键词: 2.5D器件, 硅通孔, ANSYS仿真, 结构设计

Abstract: This paper studied the structure design and simulation analysis of the TSV (Through Silicon Via) in 2.5D electronic devices by ANSYS software and ensured the more reasonable TSV structure in the aerospace application environment according to the simulation results. Firstly, we compared with the thermal mechanical behavior of several TSV Structure in the temperature cycles; then chose variable material to form four different TSV structures, studied the stress concentration behavior and long-term reliability in the those TSV structures. In the end we found the more reliable TSV structure to guarantee the 2.5D electronic devices quality to comfort with aerospace application environment.

Key words: 2.5Ddevices, throughsiliconvia, ANSYS, structuredesign

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