关键词: 离子注入, 热波探针, 角度, 剂量, 均一性

Abstract: Thermal wave probe, as a monitor method for implantation angle, dosage, and uniformity, is efficient, sensitive and contact-less. In the paper, thermal wave probe theoretical basis and data instance are introduced. The application characters and rules are studied. When used for angle monitor, mechanical position calibration and selected implant conditions are essential. When used for dosage and uniformity monitor, the dose range must be in medium and low range. The implant condition should get rid of channel effect and hot wafer effect.

Key words: implantation, thermal wave probe, angle, dosage, uniformity