中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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• 封装、组装与测试 •    下一篇

Sn-Pb铜核微焊点液-固界面反应及力学性能研究

丁钰罡,陈湜,乔媛媛,赵宁   

  1. 大连理工大学材料科学与工程学院,辽宁 大连  116024
  • 收稿日期:2025-02-27 修回日期:2025-03-24 出版日期:2025-04-02 发布日期:2025-04-02
  • 通讯作者: 赵宁
  • 基金资助:
    国家自然科学基金(52075072);山东省重点研发计划(重大科技创新工程)(2022CXGC020408)

Study on Liquid-Solid Interfacial Reactions and Mechanical Property of Cu-cored Sn-Pb Micro Solder Joints

DIING Yugang, CHEN Shi, QIAO Yuanyuan, ZHAO Ning   

  1. School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China
  • Received:2025-02-27 Revised:2025-03-24 Online:2025-04-02 Published:2025-04-02

摘要: Cu核微焊点相比传统Sn基微焊点具有更好的导电、导热及力学性能,且可有效控制焊点高度。本文首先探究了Sn-Pb合金电沉积工艺,随后电镀制备出Cu@Sn-Pb、Cu@Ni@Sn-Pb两种Cu核微焊球,进一步研究了微焊点在250 ℃下回流的液-固界面反应,并探究了微焊点的剪切断裂机理。结果表明,Sn-Pb镀层成分受Pb2+浓度、络合剂浓度、电流密度以及镀液温度等因素影响。镀液温度为25 ℃,电流密度为1~2 A/dm2,电镀效果最佳。回流后,Cu/Cu@Sn-Pb/Cu微焊点中Sn-Pb/Cu核及Sn-Pb/Cu基板界面处均形成厚度相近的扇贝状Cu6Sn5及薄层状Cu3Sn界面金属间化合物;而Cu/Cu@Ni@Sn-Pb/Cu微焊点中Sn-Pb/Ni/Cu核及Sn-Pb/Cu基板界面上均形成扇贝状(Cu,Ni)6Sn5 IMC,由于Cu-Ni交互作用,Cu3Sn IMC生长受到抑制,且Cu基板侧IMC层厚度明显大于Cu核侧。剪切测试结果表明,回流1 min时,Cu/Cu@Ni@Sn-Pb/Cu微焊点与Cu/Cu@Sn-Pb/Cu微焊点剪切强度分别为55.2 MPa和47.9 MPa,镀Ni层后焊点强度提高15.5%。

关键词: 电子封装, Sn-Pb钎料, Cu核微焊点, 液-固界面反应, 金属间化合物

Abstract: Cu-cored micro solder joints exhibited superior electrical conductivity, thermal conductivity, and mechanical properties compared to traditional Sn-based micro solder joints, enabling effective control for the height of the solder joints. This paper initially investigated the electrodeposition process of Sn-Pb alloys and fabricated Cu-cored solder balls (Cu@Sn-Pb and Cu@Ni@Sn-Pb) through electroplating. And then the Cu/Cu@Ni@Sn-Pb/Cu and Cu/Cu@Sn-Pb/Cu solder joints were prepared to investigate the liquid-solid interfacial reactions during reflow at 250 ℃ and to further explore the shear fracture mechanism. The results indicated that the composition of the Sn-Pb coating was influenced by the concentration of the Pb2+, methanesulfonic acid concentration, current density, and electroplating solution temperature, among which the concentration of the Pb2+ was the most significant factor. The optimal plating results were achieved with the electroplating solution temperature at 25 ℃ and the current density as 1~2 A/dm². After reflow, Cu/Cu@Sn-Pb/Cu solder joints formed scallop Cu6Sn5 intermetallic compounds (IMC) and thin laminar Cu3Sn IMC on both sides of the Sn-Pb/Cu-core and Sn-Pb/Cu-substrate interface. In contrast, Cu/Cu@Ni@Sn-Pb/Cu solder joints developed scallop (Cu,Ni)6Sn5 IMC on the Sn-Pb/Ni/Cu-core side and columnar (Cu,Ni)6Sn5 IMC on the Sn-Pb/Cu-substrate side after reflow, with the growth of Cu3Sn IMC being suppressed. The thickness of (Cu,Ni)6Sn5 IMC on the Sn-Pb/Cu-substrate side was significantly superior to that on the Sn-Pb/Ni/Cu-core side. Shear test results revealed that the shear strength of Cu/Cu@Ni@Sn-Pb/Cu solder joints and Cu/Cu @Sn-Pb/Cu solder joints was respectively 55.2 MPa and 47.9 MPa and the solder joint strength was increased by 15.5% after reflow for 1 min.

Key words: electronic packaging, Sn-Pb solder, Cu-cored micro solder joints, liquid-solid interfacial reaction, intermetallic compound