中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2023, Vol. 23 ›› Issue (2): 020402 . doi: 10.16257/j.cnki.1681-1070.2023.0006

• 材料、器件与工艺 • 上一篇    下一篇

多重场限环型终端结构的优化设计*

卓宁泽;赖信彰;于世珩   

  1. 江苏长晶科技股份有限公司,南京 210000
  • 收稿日期:2022-07-19 发布日期:2023-02-23
  • 作者简介:卓宁泽(1989—),男,江苏南京人,博士,高级工程师,主要研究方向为功率半导体器件设计及制造。

Optimum Design of Multi-Field Limiting Ring TerminationStructure

ZHUO Ningze, LAI Hsinchang, YU Shihheng   

  1. Jiangsu Changjing Electronic Technology Co., Ltd., Nanjing 210000,China
  • Received:2022-07-19 Published:2023-02-23

摘要: 开展了硅基金属氧化物场效应晶体管用多重场限环型终端结构的优化设计工作。研究了体区注入剂量、场限环宽度、主结宽度对击穿电压的影响规律,并对其机理进行了分析。通过仿真获得了器件内部的电场、电势和碰撞电离率分布。通过逐步优化获得了最终结构和工艺参数,体区注入剂量为1.3×1013 cm?3,场限环宽度为1.5 μm,主结宽度为11 μm,对应终端击穿电压为106 V。实验开版流片获得的器件击穿电压为105.6 V,良率达到98.65%。

关键词: 场限环, 终端结构, 硅基金属氧化物场效应晶体管, 击穿电压

Abstract: The optimum design of the multi-field limiting ring termination structure for the silicon-based metal-oxide-semiconductor field-effect transistor is carried out. The influences of the body dose, the field limiting ring width, and the main junction width on the breakdown voltage are studied, and the mechanisms are analyzed. The distributions of electric field, potential and impact ionization rate in the device are obtained by simulation. Through gradual optimization, final structure and process parameters are obtained. The body dose is 1.3×1013 cm?3, field limiting ring width is 1.5 μm, main junction width is 11 μm, and final breakdown voltage is 106 V. The breakdown voltage of the device obtained through the experimental tape-out is 105.6 V, and the yield reaches 98.65%.

Key words: field limiting ring, termination structure, silicon-based metal-oxide-semiconductor field-effect transistor, breakdown voltage

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