中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2023, Vol. 23 ›› Issue (9): 090205 . doi: 10.16257/j.cnki.1681-1070.2023.0128

• 封装、组装与测试 • 上一篇    下一篇

电镀纯锡镀层与钢带结合强度的优化研究*

周杰1,胡宇昆2   

  1. 1. 深圳赛意法微电子有限公司,广东 深圳 518038;2. 华中科技大学材料科学与工程学院材料成形与模具技术国家重点实验室,武汉 430074
  • 收稿日期:2023-04-06 出版日期:2023-09-25 发布日期:2023-09-25
  • 作者简介:周杰(1983—),男,湖北赤壁人,硕士,主要研究方向为半导体器件设计、工艺开发和微电子封装测试。

Research on Optimization of Bonding Strength Between Plating Layer and Steel Strip for Electroplating Pure Tin

ZHOU Jie1, HU Yukun2   

  1. 1. STMicroelectronics Co.,Ltd., Shenzhen 518038, China; 2. State Key Laboratory of Material Processing and Die andMould Technology, School of Materials Science and Engineering,Huazhong University of Science and Technology, Wuhan 430074, China
  • Received:2023-04-06 Online:2023-09-25 Published:2023-09-25

摘要: 电镀工艺被广泛应用于半导体封装测试领域。在电镀纯锡的过程中,传送钢带夹具易出现镀层结合力差的问题,导致锡粉掉落及黏附于产品表面。基于电镀原理综合分析电镀缺陷发生机制及影响因素,分别从活化过程、预浸过程、电镀液成分及电流密度4个方面提出改善镀层与钢带结合强度的途径。结合实际电镀工艺改进案例,提出在活化槽中增加0.3~0.6 V的反向活化直流电压、在预浸过程选取30~50 A的电流、将活化槽液位提高5~10 mm、将电镀电流控制在95~125 A及将锡离子的质量浓度控制在50~80 g/L等改进工艺,可以有效提高镀层与钢带的结合强度。

关键词: 电镀纯锡, 镀层, 钢带, 结合力, 工艺优化

Abstract: Electroplating processis widely used in the fields of semiconductor packaging and testing. During the process of electroplating pure tin, the problem of poor adhesion of the plating layer may occur in the conveyor steel belt fixture, resulting in the tin powder falling off and adhering to the surface of product.Based on the principle of electroplating, the mechanism and influencing factors of electroplating defects are analyzed comprehensively.And the ways to improve the bonding strength of plating layer and steel strip are proposed from four aspects, activation process, pre-immersion process, composition of electroplating solution and current density.Combined with the actual electroplating process improvement cases, it is proposed to increase the reverse activation DC voltage of 0.3-0.6 V in the activation tank, select the current of 30-50 A during the pre immersion process, increase the liquid level of the activation tank by 5-10 mm, control the electroplating current to 95-125 A and control the mass concentration of tin tons to 50-80 g/L, which can improve the bonding strength between the plating layer and the steel strip effectively.

Key words: electroplating pure tin, plating layer, steel strip, bonding force, process optimization

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