中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2023, Vol. 23 ›› Issue (9): 090202 . doi: 10.16257/j.cnki.1681-1070.2023.0123

• 封装、组装与测试 • 上一篇    下一篇

半加成工艺中薄化铜后烘烤对剥离强度的影响

林君逸1,俞宏坤1,欧宪勋2,程晓玲2,林佳德2   

  1. 1.复旦大学材料科学系,上海 200433;2.日月光半导体上海有限公司,上海 201203
  • 收稿日期:2023-04-09 出版日期:2023-09-25 发布日期:2023-06-27
  • 作者简介:林君逸(2000—),男,江苏南通人,硕士研究生,主要研究方向为集成电路封装与微分析。

Effect of Baking After Electroless Cu Plating on Peel Strength in Semi-Additive Process

LIN Junyi1,YU Hongkun1,OU Xianxun2,CHENG Xiaoling2, LIN Jiade2   

  1. 1. Department of Materials Science, Fudan University, Shanghai 200433, China;2.AdvancedSemiconductor EngineeringShanghaiLtd.,Shanghai 201203, China
  • Received:2023-04-09 Online:2023-09-25 Published:2023-06-27

摘要: 近年来,半加成法成为了一种新的印制电路板的线路制作工艺,但其存在树脂与铜箔间的剥离强度不高的问题。通过拉力测试以及扫描电子显微镜、红外光谱、X射线光电子能谱的表征,探究了BT树脂基板在薄化铜后进行烘烤对树脂剥离强度的影响。研究结果表明,板材的失效模式是树脂的内聚破坏,经过烘烤后,树脂与增强颗粒间的结合力下降,树脂本身会受到铜离子催化氧化的影响,结构发生改变,导致强度降低。对失效机理的研究为半加成法提供了改进思路。

关键词: BT树脂, 覆铜板, 烘烤, 剥离强度, 半加成工艺

Abstract: In recent years, the semi-additive process has become a new circuit manufacturing process for printed circuit boards, but it has the problem of low peel strength between resin and copper foil. The influence of baking BT resin substrate on the peel strength after electroless Cu plating is explored through tensile testing, scanning electron microscopy, infrared spectroscopy, and X-ray photoelectron spectroscopy (XPS).The results show that the failure mode of the plate is the cohesion failure of the resin, the adhesion between the resin and the reinforcing particles decreases after baking, and the resin itself will be affected by the catalytic oxidation of copper ions, which changes the structure and reduces the strength.Through the study of the failure mechanism, it can provide improvement ideas for the semi-additive process.

Key words: BT resin, copper clad laminate, baking, peel strength, semi-additive process

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