中国半导体行业协会封装分会会刊

中国电子学会电子制造与封装技术分会会刊

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电子与封装 ›› 2025, Vol. 25 ›› Issue (5): 050109 . doi: 10.16257/j.cnki.1681-1070.2025.0141

• “面向先进封装应用的铜互连键合技术”专题 • 上一篇    下一篇

先进封装中铜柱微凸点互连技术研究进展*

张冉远,翁铭,黄文俊,张昱,杨冠南,黄光汉,崔成强   

  1. 广东工业大学省部共建精密电子制造技术与装备国家重点实验室,广州  510006
  • 收稿日期:2025-03-03 出版日期:2025-06-04 发布日期:2025-06-04
  • 作者简介:张冉远(2000—),男,广东潮州人,硕士研究生,主要研究方向为微电子封装工艺与材料。

Research Progress of Copper Pillar Micro-Bump Interconnect Technology in Advanced Packaging

ZHANG Ranyuan, WENG Ming, HUANG Wenjun, ZHANG Yu, YANG Guannan, HUANG Guanghan, CUI Chengqiang   

  1. State Key Laboratory of Precision ElectronicManufacturing Technology and Equipment, GuangdongUniversity of Technology, Guangzhou 510006, China
  • Received:2025-03-03 Online:2025-06-04 Published:2025-06-04

摘要: 超高密度互连、三维异构集成是当前微电子技术发展的趋势,铜柱微凸点作为先进封装互连的核心技术,提供了高性能、多样化的应用方案。讨论了焊料铜柱微凸点互连的原理、特性及挑战,详细阐述了瞬态液相互连技术及固态扩散互连技术的研究进展,概述了纳米材料修饰铜柱微凸点互连的不同方案,分析了各类材料的互连特性及性能。最后总结展望了铜柱微凸点互连技术未来的发展方向。

关键词: 先进封装, 铜柱微凸点, 焊料, 纳米材料

Abstract: Ultra-high density interconnection and three-dimensional heterogeneous integration are the current development trends of microelectronics technology. Copper pillar micro-bumps, as the core technology of advanced packaging interconnections, provide high-performance and diversified application solutions. The principles, characteristics and challenges of solder copper pillar micro-bump interconnections are discussed, recent advancements in transient liquid-phase and solid-state diffusion interconnection technologies are described in detail, different schemes of nano-material-modified copper pillar micro-bump interconnections are outlined, and the interconnection characteristics and performance of various materials are analyzed. Finally, the future directions of copper pillar micro-bump interconnection technology are summarized.

Key words: advanced packaging, copper pillar micro-bump, solder, nano-material

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